Nanoimprint Lithography: An Enabling Process for Nanofabrication [electronic resource] / by Weimin Zhou.

By: Zhou, Weimin [author.]Contributor(s): SpringerLink (Online service)Material type: TextTextLanguage: English Publisher: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2013Description: XIII, 249 p. 225 illus., 107 illus. in color. online resourceContent type: text Media type: computer Carrier type: online resourceISBN: 9783642344282Subject(s): Engineering | Nanochemistry | Optical materials | Nanotechnology | Engineering | Nanotechnology and Microengineering | Optical and Electronic Materials | Nanotechnology | NanochemistryAdditional physical formats: Printed edition:: No titleDDC classification: 620.5 LOC classification: T174.7Online resources: Click here to access online
Contents:
Principles and statues of nanoimprint lithography -- Stamp Fabrication -- stamp surface treatment -- Nanoimprint lithography resists -- Nanoimprint lithography process -- Modeling and Simulation of NIL -- Application of NIL in Light emitting Diodes -- Application of NIL in memory devices -- Application of NIL in solar cell.
In: Springer eBooksSummary: Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
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Principles and statues of nanoimprint lithography -- Stamp Fabrication -- stamp surface treatment -- Nanoimprint lithography resists -- Nanoimprint lithography process -- Modeling and Simulation of NIL -- Application of NIL in Light emitting Diodes -- Application of NIL in memory devices -- Application of NIL in solar cell.

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

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