Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System (Record no. 14528)

000 -LEADER
fixed length control field 02803nam a22005175i 4500
001 - CONTROL NUMBER
control field 978-4-431-54795-2
003 - CONTROL NUMBER IDENTIFIER
control field DE-He213
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20141015144337.0
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr nn 008mamaa
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 140128s2014 ja | s |||| 0|eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9784431547952
-- 978-4-431-54795-2
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1007/978-4-431-54795-2
Source of number or code doi
041 ## - LANGUAGE CODE
Language code of text/sound track or separate title eng
050 #4 - LIBRARY OF CONGRESS CALL NUMBER
Classification number T174.7
072 #7 - SUBJECT CATEGORY CODE
Subject category code TDPB
Source bicssc
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC027000
Source bisacsh
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 620.5
Edition number 23
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Samukawa, Seiji.
Relator term author.
245 10 - TITLE STATEMENT
Title Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
Medium [electronic resource] /
Statement of responsibility, etc by Seiji Samukawa.
260 #1 - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication, distribution, etc Tokyo :
Name of publisher, distributor, etc Springer Japan :
-- Imprint: Springer,
Date of publication, distribution, etc 2014.
264 #1 -
-- Tokyo :
-- Springer Japan :
-- Imprint: Springer,
-- 2014.
300 ## - PHYSICAL DESCRIPTION
Extent VIII, 40 p. 35 illus., 30 illus. in color.
Other physical details online resource.
336 ## -
-- text
-- txt
-- rdacontent
337 ## -
-- computer
-- c
-- rdamedia
338 ## -
-- online resource
-- cr
-- rdacarrier
347 ## -
-- text file
-- PDF
-- rda
490 1# - SERIES STATEMENT
Series statement SpringerBriefs in Applied Sciences and Technology,
International Standard Serial Number 2191-530X
505 0# - FORMATTED CONTENTS NOTE
Formatted contents note Introduction -- On-wafer UV sensor and prediction of UV irradiation damage -- Prediction of Abnormal Etching Profiles in High-aspect-ratio Via/Hole Etching Using On-wafer Monitoring System -- Feature Profile Evolution in Plasma Processing Using Wireless On-wafer Monitoring System.
520 ## - SUMMARY, ETC.
Summary, etc This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Engineering.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Nanotechnology.
650 14 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Engineering.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Nanotechnology and Microengineering.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Nanoscale Science and Technology.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Nanotechnology.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Plasma Physics.
650 24 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element Semiconductors.
710 2# - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element SpringerLink (Online service)
773 0# - HOST ITEM ENTRY
Title Springer eBooks
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Display text Printed edition:
International Standard Book Number 9784431547945
830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE
Uniform title SpringerBriefs in Applied Sciences and Technology,
-- 2191-530X
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier http://dx.doi.org/10.1007/978-4-431-54795-2
912 ## -
-- ZDB-2-ENG
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type E-Books

No items available.


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